The semiconductor industry is under increasing pressure to meet ambitious Net Zero targets by 2030. The industry’s largest customers, stakeholders, and regulatory agencies are now expecting fabs to reduce and verify greenhouse gas emissions, particularly Scope 1 emissions from high global warming potential gases, such as NF3, PFCs, HFCs, SF6, and N2O.
While expectations are clear, facility roadmaps to achieving these targets are often undeveloped and heavily reliant on manual testing processes and outdated methodologies to obtain the necessary emissions data. Coupled with the ongoing evolution of finer line process geometries and the growth in scale of fab capacity, manually managing these emissions is becoming prohibitively time-consuming and straining for facility environmental teams.
Spectrum’s automated, real-time monitoring solutions offer wafer fabs the opportunity to reduce time spent on measurement and reporting, minimize the risk of costly inaccuracies, and demonstrate progress toward Net Zero benchmarks with accurate, measured results.
Spectrum provides a suite of solutions that enables fabs to monitor, manage, and report GHG emissions across their entire facility.
We will conduct full-site air emissions assessments, including mapping, testing, and reporting across tool sets and abatement systems. We establish a comprehensive monitoring plan for GHG end-of-pipe emissions and provide support to facility teams through audits and reporting.
We have developed and deployed the WaveRunIR-DRE-MSS, the industry’s first mobile, automated POU DRE measurement system. Using a dual-FTIR approach, we simultaneously measure the POU inlet and outlet gases with an efficiency that allows for multiple POU DRE tests in a day. Our software-controlled system automates DRE calculations and provides real-time dashboards and downloadable reports, saving fabs hundreds of thousands of dollars in employee hours and equipment costs.
Our FTIR-based Lateral Monitoring Network incorporates sequential sampling of exhaust laterals to provide a constant watchdog of abatement performance across the entire fab. These networks support early detection of poorly performing POU abatement devices, bypass conditions, runaway/leaking controllers, and impacts from process changes. With continuous monitoring and interactive data dashboards, fabs can quickly:
Spectrum provides emissions characterization at the tool level, supporting Etch and CVD tool manufacturers with emissions data used for process recipe optimization, identification of alternative chemistries/compounds, and determination of potential safety or environmental impacts.
We provide annual comprehensive emissions measurements in support of permit and/or corporate emission requirements, including measurement of:
Spectrum has developed a continuous process monitor (WaveRunIR-CPM) that is uniquely designed for real-time semiconductor tools and process chamber in-line monitoring and optimization. Specifically, this device monitors abatement catalysts that are part of tools in high-volume manufacturing and provides real-time end-of-life catalyst results to tool operators and EHS staff.
Spectrum Environmental Solutions scientists bring over 100+ combined years of expertise in FTIR-based gas-phase monitoring for the semiconductor industry. We offer turn-key services including equipment design and deployment, data management, regulatory consulting, and ongoing technical support.
Our clients rely on us not only for accurate emissions data but also for the strategic insight and infrastructure needed to stay informed and aligned with environmental goals. Spectrum is committed to helping our semiconductor clients navigate the path to Net Zero with clarity and confidence, in a cost-effective manner.
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